Equipment

XeF2 etcher | XeF2 etcher (지논다이플로라이드 에쳐)

보유장비 관련 정보
Laboratory/Field
Model XeF2 Etch System
Maker Advanced Communication Devices
Technician Kang O Kim
Contact 052-217-4182 / ko8809@unist.ac.kr
Status for Reservation 가능
Reservation Unit 4H Maximum Time (per day) 12H
Open(~ago) 14D전 Cancel (~ago) 12H
Equipment location 108동 B101호 (Bldg. 108, Room B101)
  • Description

    XeF2 가스를 이용하여 Silcon을 선택적으로 식각함.

    Etching Si by using XeF2 gas.

  • Specifications

    Etch rate : 2 um/min

    Pressure : 2000 mTorr

  • Applications

    Si Etching