XeF2 etcher | XeF2 etcher (지논다이플로라이드 에쳐)
| Laboratory/Field | |||
|---|---|---|---|
| Model | XeF2 Etch System | ||
| Maker | Advanced Communication Devices | ||
| Technician | Kang O Kim | ||
| Contact | 052-217-4182 / [email protected] | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 4H | Maximum Time (per day) | 12H |
| Open(~ago) | 14D전 | Cancel (~ago) | 12H |
| Equipment location | 108동 B101호 (Bldg. 108, Room B101) | ||
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Description
XeF2 가스를 이용하여 Silcon을 선택적으로 식각함.
Etching Si by using XeF2 gas.
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Specifications
Etch rate : 2 um/min
Pressure : 2000 mTorr
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Applications
Si Etching