Equipment

PR Asher | 폴리머 식각장치

보유장비 관련 정보
Laboratory/Field
Model V15-G
Maker KAMI
Technician Kang O Kim
Contact 052-217-4182 / ko8809@unist.ac.kr
Status for Reservation 가능
Reservation Unit 30min Maximum Time (per day) 1hr
Open(~ago) 2주전 Cancel (~ago) 2hr
  • Description

    The equipment removes selectively coated photoresist for the semiconductor process using gas plasma.

  • Specifications

    • 250 x 250 x 250 mm, aluminum chamber

    • Reactor with 250 mm water cooled chuck

    • Microwave power generator : 2.45 GHz, from 100 up to max. 600 W

    • Gas inlet : 2 gas inlet pipes (top side mounted)

    • O2, Ar gas control unit (MFC) : ≥ 200 ml/min

    • Process storage capability of 10 main process with 16 sub-process, rotation table 19”

  • Applications

    • Polymer elimination

    • Photoresist residue elimination

    • Polymer layer thickness control