Wet station_Acid#3 | 습식세정장치 산#3
| Laboratory/Field | |||
|---|---|---|---|
| Model | Wet station | ||
| Maker | Changshintech | ||
| Technician | Song-Hee Lee | ||
| Contact | 052-217-4190 / lychle2@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 30min | Maximum Time (per day) | 3Hr |
| Open(~ago) | 2주전 | Cancel (~ago) | 2Hr |
| Equipment location | 108동 B101호 (Bldg. 108, Room B101) | ||
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Description
습식 세정 공정 (산성 용액)
불산, 황산/과수 용액을 사용
최대 8인치 웨이퍼 공정이 가능함 (가열가능)
금속 세정 공정 불가Wet cleaning and etching process by Acidic chemical.
Max. 8inch (3ea) loaded in process bath with heating.
Metal cleaning is unavilable. -
Specifications
• Chemical supply : Manual
• Chemical temp. : ~ 80℃
• Chemical type : SPM, DHF(BOE)
• Chemical drain : 20L bottle drain (air valve)
• 2 Q.D.R bath, 1 Drain bath cup
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Applications
• Wafer chemical cleaning
• Wafer DI Water rinsing
• Oxide removal