Equipment

Wet station_Acid | 습식 세정장치

보유장비 관련 정보
Laboratory/Field
Model Wet Station
Maker Donghoon tech
Technician Kim Kang O
Contact 052-217-4182 / ko8809@unist.ac.kr
Status for Reservation 가능
Reservation Unit 30min Maximum Time (per day) 3hr
Open(~ago) 2주전 Cancel (~ago) 2hr
  • Description

    This device allows 6” wafer to progress into photoresist development and wet etching process.

  • Specifications

    • Chemical supply : manual

    • Chemical temp. : 50 ~ 120

    • Chemical drain : bottle drain (air valve)

    • PR wet station (2 Set) : ultrasonic bath, develop bath, Q.D.R bath

    • Acid wet station : SC-1, 2 bath, SPM bath, BOE bath, DHF bath, H3PO4 bath, Q.D.R bath

    • Solvent wet station

    • Etching wet station

    • MEMS wet station

    • CMOS wet station

  • Applications

    • Photoresist developing

    • Surface cleaning

    • Wet etching (Si wafer/SiO2 layer etc. )