Equipment

Thickness measurement | 박막 두께 측정기

보유장비 관련 정보
Laboratory/Field
Model ST4000-DLX
Maker K-MAC
Technician Hae-ra Kang
Contact 052-217-4167 / haera@unist.ac.kr
Status for Reservation 가능
Reservation Unit 30min Maximum Time (per day) 1hr
Open(~ago) 2주전 Cancel (~ago) 2hr
  • Description

    Some portion of the light that is incident on the thin film surface is reflected
    from the upper surface of the sample, other portion is reflected from the
    interfaces between the thin film and the substrate.

  • Specifications

    • Detector : used wavelength range is 400 ~ 800 nm

    linear silicon CCD array (2048 pixel)

    • Stage size : 300 mm x 300 mm (12 inch wafer)

    • Lens : m 5 x, m10 x, m 50 x

    • Spot size : 40μm, 20μm, 4μm

    • Reflection probe : choose wavelength (300 ~ 800 nm)

    • Thickness measurement range : 100 Å ~ 50μm

    • Theoretical resolution : 1 nm

  • Applications

    • Semiconductor : Poly-Si, GaAs, GaN, ZnS, SiGe, ONO, SOI, SiLk

    • Dielectric material : SiO2, Si3N4, ITO, TiO2, ZrO2, BTS, HfO2

    • Polymer : PVA, PET, PP, PR