Equipment

Spin Coater | 감광제 도포기

보유장비 관련 정보
Laboratory/Field
Model JSPD
Maker JD Tech
Technician Goh Myeong Bae
Contact 052-217-4189 / bgm0421@unist.ac.kr
Status for Reservation 가능
Reservation Unit 30min Maximum Time (per day) 3hr
Open(~ago) 2주전 Cancel (~ago) 2hr
  • Description

    The device which deposits the uniformly thick & thin Photo-resists by high speed.

  • Specifications

    • Wafer suitability loading size

    • Chamber size : 300 mm diameter

    • Sample size : piece ~ 6 inch

    • Rotation speed : Max. 5,000 rpm

    • Vacuum input : - 450 mmHg ~ - 750 mmHg

  • Applications

    • Adhesion treatment on substrates

    • Photo resist coating