Spin Coater | 감광제 도포기
| Laboratory/Field | |||
|---|---|---|---|
| Model | JSPD | ||
| Maker | JD Tech | ||
| Technician | Eun Jeong Hwang | ||
| Contact | 052-217-4192 / hej9204@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 30min | Maximum Time (per day) | 3hr |
| Open(~ago) | 2주전 | Cancel (~ago) | 2hr |
| Equipment location | 108동 B101호 (Bldg. 108, Room B101) | ||
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Description
The device which deposits the uniformly thick & thin Photo-resists by high speed.
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Specifications
• Wafer suitability loading size
• Chamber size : 300 mm diameter
• Sample size : piece ~ 6 inch
• Rotation speed : Max. 5,000 rpm
• Vacuum input : - 450 mmHg ~ - 750 mmHg
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Applications
• Adhesion treatment on substrates
• Photo resist coating