Schottky FE-SEM with e-beam attachment | 쇼트키 전계방출전자현미경과 부착형 이빔리소그래피
| Laboratory/Field | |||
|---|---|---|---|
| Model | SU5000/ELPHY Multibeam | ||
| Maker | Raith | ||
| Technician | Seon Jin Lee | ||
| Contact | 052-217-4193 / sunee6210@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 30min | Maximum Time (per day) | 4hr |
| Open(~ago) | 14days | Cancel (~ago) | 2hr |
| Equipment location | Room B101, Building 108(UNFC) | ||
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Description
FE-SEM 에 E-beam lithography 장비가 부착된 형태로, 나노스케일 패터닝 공정이 가능한 장비
It is an FE-SEM with an E-beam lithography equipment attached, and is capable of nano-scale patterning processes.
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Specifications
Substrate size : Piece(up to 2x2 cm2)
Magnification: x10 ~ x600,000
Accelerating voltage: 0.5 ~ 30kV
Stage movement: X 0 ~ 100mm, Y 0 ~ 50mm, Z 3~65mm, T -20˚ ~ 90˚, R 360˚
Max. writing speed: 20MHz
Min. dwell time increment: 1ns
Pattern resolution : Min. 150nm(in case of PMMA, 6200.09)
Multi-level lithography alignment accuracy: 10nm ~ 100nm
DEBEN beam blanker & faraday cup PCD version
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Applications