Quanta 3D FIB | 이온집속빔

Laboratory/Field | |||
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Model | Quanta 3D FEG | ||
Maker | FEI | ||
Technician | Sun-yi Lee | ||
Contact | 052-217-4023 / [email protected] | ||
Status for Reservation | 가능 | ||
Reservation Unit | 0.5hr | Maximum Time (per day) | 4hr |
Open(~ago) | 5일전 | Cancel (~ago) | 2시간전 |
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Description
Dual-beam FIB has a multitude of capabilities including high resolution electron imaging, ion imaging, nano device fabrication, and material deposition. Simultaneous patterning and imaging are possible to nm resolution for both imaging and machining. FIB with both ion and electron beams enables highprecision cross-section processing and TEM/3DAP sample preparation
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Specifications
• Electron optics - Resolution
HV : 1.2 nm @30 kV
- Accelerating voltage : 1 kV ~ 30 kV
- Probe current : up to 200 nA
- Magnification : 30 x ~ 1,280 kx
• Ion optics - Resolution : 7 nm @30 kV
- Accelerating voltage : 2 ~ 30 kV
- Probe current : 1 pA ~ 65 nA
- Magnification : 40 x ~ 1,280 kx
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Applications
• Ultra high resolution electron, ion imaging
• TEM sample preparation
• Energy dispersive spectroscopy (EDS)
• EBSD image