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Quanta 3D FIB | 이온집속빔

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보유장비 관련 정보
Laboratory/Field
  • Materials Characterization Lab
  • Electron Microscopy
Model Quanta 3D FEG
Maker FEI
Technician Sun-yi Lee
Contact 052-217-4023 / [email protected]
Status for Reservation 가능
Reservation Unit 0.5hr Maximum Time (per day) 4hr
Open(~ago) 5일전 Cancel (~ago) 2시간전

  • Description

    Dual-beam FIB has a multitude of capabilities including high resolution electron imaging, ion imaging, nano device fabrication, and material deposition. Simultaneous patterning and imaging are possible to nm resolution for both imaging and machining. FIB with both ion and electron beams enables highprecision cross-section processing and TEM/3DAP sample preparation

  • Specifications

    • Electron optics - Resolution

    HV : 1.2 nm @30 kV

    - Accelerating voltage : 1 kV ~ 30 kV

    - Probe current : up to 200 nA

    - Magnification : 30 x ~ 1,280 kx

    • Ion optics - Resolution : 7 nm @30 kV

    - Accelerating voltage : 2 ~ 30 kV

    - Probe current : 1 pA ~ 65 nA

    - Magnification : 40 x ~ 1,280 kx

  • Applications

    • Ultra high resolution electron, ion imaging

    • TEM sample preparation

    • Energy dispersive spectroscopy (EDS)

    • EBSD image

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