Plasma Treatment System | 폴리머 건식 식각기
| Laboratory/Field | |||
|---|---|---|---|
| Model | V15-G | ||
| Maker | Plasma Finish | ||
| Technician | Hee-Song Hong | ||
| Contact | 052-217-4194 / [email protected] | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 1Hr | Maximum Time (per day) | 3Hr |
| Open(~ago) | 14Days | Cancel (~ago) | 1Hr |
| Equipment location | 108동 B101호 (Bldg. 108, Room B101) | ||
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Description
O2 플라즈마를 이용하여 웨이퍼 위의 감광재료와 같은 폴리머를 제거할 수 있다.
This equipment is possible to remove Polymer like PR on wafer.
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Specifications
Microwave power (2.54GHz, Max. 500 W)
Gas : O2, Ar
Stage : 8 inch size, rotation.
Chamber temp : Max. 70 ℃
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Applications
Remove polymer