Equipment

Photolitho_MDA400S | 미세패턴 정렬 노광기

보유장비 관련 정보
Laboratory/Field
Model MDA-400S
Maker MIDAS
Technician Min-jae Kim
Contact 052-217-4064 / mjkim@unist.ac.kr
Status for Reservation 가능
Reservation Unit 30min Maximum Time (per day) 3hr
Open(~ago) 2주전 Cancel (~ago) 2hr
  • Description

    MDA-400S performs alignment and exposures by UV lamp on the wafer and substrates coated by Photo-resist through mask with alignment keys.

  • Specifications

    • High efficiency & high accurate UV exposure system

    • UV lamp : Hg 350 W

    • UV 400 : 350 ~ 450 nm (I-, H-, G-line)

    • Gap adjustment accuracy : 1μm

    • Methods : top side alignment only

    • Alignment accuracy : 1μm

    • Microscope magnification : 90 x ~ 500 x

    • Fully manual type system

  • Applications

    • Micro scale patterning for semiconductor process

    • MEMS / Nano device fabrication