Equipment

Photolitho_MA6_#1 | 마스크 정렬노광기

보유장비 관련 정보
Laboratory/Field
Model MA/BA6-8
Maker Suss Microtec
Technician Goh Myeong Bae
Contact 052-217-4189 / bgm0421@unist.ac.kr
Status for Reservation 가능
Reservation Unit 30min Maximum Time (per day) 3hr
Open(~ago) 2주전 Cancel (~ago) 2hr
  • Description

    MA6 performs alignment and exposures by UV lamp on the wafer and substrates coated by Photo-resist through mask with alignment keys.

  • Specifications

    • High efficiency & high accurate UV exposure system

    • UV lamp : Hg 350 W

    • UV 400 : 350 ~ 450 nm (I-, H-, G-line)

    • Gap adjustment accuracy : 1μm

    • Methods : top & back side alignment

    • Alignment accuracy : 1μm

    • Exposure type : vacuum, low vac., proximity, hard, soft, flood-exposure mode

    • Semi automatic system

  • Applications

    • Micro scale patterning for semiconductor process

    • MEMS / Nano device fabrication