Metal RIE | 메탈 건식 식각장치
| Laboratory/Field | |||
|---|---|---|---|
| Model | Labstar | ||
| Maker | TTL | ||
| Technician | Seon Jin Lee | ||
| Contact | 052-217-4193 / sunee6210@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 1hr | Maximum Time (per day) | 1hr |
| Open(~ago) | 2주전 | Cancel (~ago) | 2hr |
| Equipment location | 108동 B101호 (Bldg. 108, Room B101) | ||
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Description
Metal RIE is an ion etching system for metal (Al, Ti, Cr, W, and Au) pattern formation.
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Specifications
• RF Power : Max. 500W
• Pressure : 0~1000 mTorr
• Gas : Cl2, SF6, Ar, O2
• Sample : Max. 6 inch
• Chiller : 15 degree
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Applications
• Dry etching process for metal layer (Al, W, Ti, and Cr)
(Except Cu, Ni)