Metal ICP-RIE#2 | 유도결합플라즈마 금속 건식 식각기#2
| Laboratory/Field | |||
|---|---|---|---|
| Model | ICP380 | ||
| Maker | Oxford instruments | ||
| Technician | Kang O Kim | ||
| Contact | 052-217-4182 / ko8809@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 1Hr | Maximum Time (per day) | 3Hr |
| Open(~ago) | 14Days | Cancel (~ago) | 1Hr |
| Address | ko8809@unist.ac.kr | ||
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Description
기본적으로 웨이퍼가 로딩되어서 금속박막 및 금속재료를 식각이 가능한 장비이다.
It is used for Metal dry etch and loading wafers.
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Specifications
Loadlock, Process chamber
RF power (source : Max. 2000W, bias : Max. 300W)
Loading : 6 inch wafer
Gas : Cl2, Ar, Or
Back He cooling (Heater and Chiller mode)
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Applications
Metal dry etching.