Equipment

Metal ICP-RIE#2 | 유도결합플라즈마 금속 건식 식각기#2

보유장비 관련 정보
Laboratory/Field
Model ICP380
Maker Oxford instruments
Technician Kang O Kim
Contact 052-217-4182 / ko8809@unist.ac.kr
Status for Reservation 가능
Reservation Unit 1Hr Maximum Time (per day) 3Hr
Open(~ago) 14Days Cancel (~ago) 1Hr
Address ko8809@unist.ac.kr
  • Description

    기본적으로 웨이퍼가 로딩되어서 금속박막 및 금속재료를 식각이 가능한 장비이다.

    It is used for Metal dry etch and loading wafers.

  • Specifications

    Loadlock, Process chamber

    RF power (source : Max. 2000W, bias : Max. 300W)

    Loading : 6 inch wafer

    Gas : Cl2, Ar, Or

    Back He cooling

  • Applications

    Metal dry etching.