Laser lithography | 레이저 리소그래피
| Laboratory/Field | |||
|---|---|---|---|
| Model | Picomaster200 | ||
| Maker | Raith | ||
| Technician | Eun Jeong Hwang | ||
| Contact | 052-217-4192 / hej9204@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 30 min | Maximum Time (per day) | 4H |
| Open(~ago) | 14Day | Cancel (~ago) | 2hr |
| Equipment location | 108동 B101호 나노소자공정실 | ||
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Description
405nm GaN laser를 이용하여 um에서 nm단위 구조까지 구현이 가능하며, 8인치 크기까지 로딩이 가능한 Lithography 장비
It is a equipment that can implement micro to nano structures using a 405nm GaN laser, and is a lithography equipment that can load up to 8 inches in size.
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Specifications
Standalone system
- Highest resolution 405nm diode laser
- Sample size : Up to 8” wafer
- Structures : 300nm
- Substrate size: up to 220×220mm
- Substrate thickness: up to 4mm
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Applications