Equipment

High Power XRD(HPXRD) | 고출력 X선 회절기

보유장비 관련 정보
Laboratory/Field
Model D/MAX2500V/PC
Maker Rigaku
Technician Gyeong Ae Lee
Contact 052-217-4163 / kalee@unist.ac.kr
Status for Reservation 불가능
Reservation Unit 0.5hr Maximum Time (per day) 2hr
Open(~ago) 5일전 Cancel (~ago) 2시간전
Equipment location B101-2, Bldg.102
  • Description

    ○ 자율사용전용 -> XRD 분석 의뢰는 HRPXRD 장비로 요청해 주세요.

    ○ 응용: 분말/박막 결정구조 분석

    ○ 측정범위: 0.5~110 도

    ○ 샘플량: 분말 0.5 mg 이상, 박막 1um 이상
    ○ 샘플준비
    - 분말: 압분체(5㎛ 또는 325 mesh 이하)로 준비​
    - 박막: 가로세로 1cm ~ 2cm 크기로 준비(윗면과 바닥 모두 이물질 없는 깨끗한 상태로 준비​, 금속시편은 표면 polishing)

    ○ For self-use only -> Please request XRD analysis using HRPXRD

    ○ Application: Crystal structure analysis of powder or thin film

    ○ Measurement range: 0.5~110 degrees

    ○ Sample amount: Powder 0.5 mg or more, thin film 1 um or more
    ○ Sample preparation
    - Powder: Prepare as a press(5㎛ or 325 mesh or less)
    - Thin film: Prepare in a size of 1cm to 2cm in width and length(Dust free, metal need surface polishing)

  • Specifications

    • X-ray source : Cu-rotating anode x-ray

    • Focus : line focus

    • X-ray generator : 3 phase, 380 V, 18 kW

    • Goniometer (angular range) : - 60 ° ~ 128 °

    -2theta range : 0.8° ~120°

    • Attachment

    - high temperature (RT ~ 1,100 °C)

  • Applications

    • Characterization of materials with temperature variation