Dielectric RIE | 건식 식각장치
| Laboratory/Field | |||
|---|---|---|---|
| Model | Labstar | ||
| Maker | TTL | ||
| Technician | Kang Oh Kim | ||
| Contact | 052-217-4182 / ko8809@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 30min | Maximum Time (per day) | 1hr |
| Open(~ago) | 2주전 | Cancel (~ago) | 2hr |
| Equipment location | 108동 B101호 (Bldg. 108, Room B101) | ||
-
Description
Reactive ion etcher forms fine patterns by dry etching placing wafer inside the process module and generating plasma.
-
Specifications
• RF Power : Max. 500 W
• Pressure : 0~1000 mTorr
• Gas : CF4, CHF3, Ar, O2 (Max. 200 sccm for each)
• Sample Size : Max. 6 inch
-
Applications
• Si / SiO2 / Si3N4 dry etching
• ETC. material etching (Not metal)