포토레지스트 트랙 시스템 | 포토레지스트 트랙 시스템
| Laboratory/Field | |||
|---|---|---|---|
| Model | SSP200 | ||
| Maker | SVS | ||
| Technician | Eun-Jeong Hwang | ||
| Contact | / hej9204@unist.ac.kr | ||
| Status for Reservation | 불가능 | ||
| Reservation Unit | Maximum Time (per day) | ||
| Open(~ago) | Cancel (~ago) | ||
| Equipment location | 108동 B101호 (Bldg.108, Room B101) | ||
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Description
양자 광소자 제작을 위한 나노 단위 리소그래피 공정 전, 레지스트 물질 스핀 코팅을 위한 자동화 지원 설비
Automated support equipment for spin-coating resist materials prior to nano-scale lithography processes for fabricating quantum photonic devices.
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Specifications
* Spin coater
- Speed range : 0 ~ 6,000rpm
- Speed accuracy : Setting RPM ± 1rpm
- Back side rinse(Back side rinse) : 2-Nozzle position(Acetone)
- Coater bowl exhaust : 2-hole exhaust
* Hot-plate
- Temperature control range : 50℃~ 200℃
- Temperature uniformity : ≤0.8℃
- Coater bowl exhaust : 2-hole exhaust
* Cool-plate (2set)
- Temperature control range : 20℃~ 250℃(setting unit : 0.1℃)
- Temperature uniformity : ≤0.2℃
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Applications
* Spin coater
- Speed range : 0 ~ 6,000rpm
- Speed accuracy : Setting RPM ± 1rpm
- Back side rinse(Back side rinse) : 2-Nozzle position(Acetone)
- Coater bowl exhaust : 2-hole exhaust
* Hot-plate
- Temperature control range : 50℃~ 200℃
- Temperature uniformity : ≤0.8℃
- Coater bowl exhaust : 2-hole exhaust
* Cool-plate (2set)
- Temperature control range : 20℃~ 250℃(setting unit : 0.1℃)
- Temperature uniformity : ≤0.2℃