NLD Etcher | NLD Etcher(양자 광소자 식각장치)
| Laboratory/Field | |||
|---|---|---|---|
| Model | NLD-570 | ||
| Maker | ULVAC | ||
| Technician | Seon Jin Lee | ||
| Contact | 052-217-4193 / sunee6210@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 0.5H | Maximum Time (per day) | 3H |
| Open(~ago) | 14 days | Cancel (~ago) | 2H |
| Equipment location | 108동 B101호 양자나노팹 | ||
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Description
Neutral Loop Discharge(NLD) 플라즈마를 이용하여 저손상·고밀도 환경에서 양자 및 반도체 소자 공정을 위한 정밀 건식 식각을 수행하는 장비.
A dry etching system that utilizes Neutral Loop Discharge (NLD) plasma to perform precision dry etching for quantum and semiconductor device fabrication under low-damage, high-density plasma conditions.
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Specifications
RF Source power : Max. 2000W
RF Bias power : Max. 1000W
Temp. : -20℃ ~ 40℃
Wafer size : up to 8inch
SiO2 Etch rate : almost 500nm/min(6inch Full wafer)
Bulk LN etch rate : almost 70nm/min(1cm x 1cm piece)
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Applications
Lithium Niobate, SiO2 etching