Hitachi Sputter
| Laboratory/Field | |||
|---|---|---|---|
| Model | E-1045 | ||
| Maker | Hitachi | ||
| Technician | Gyeong Ae Lee | ||
| Contact | 052-217-4163 / kalee@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 10분 | Maximum Time (per day) | |
| Open(~ago) | Cancel (~ago) | ||
| Equipment location | 102동 B109호(Bldg.102, Room B109) | ||
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Description
Sputter system employs a magnetron target assembly, which enhances the efficiency of the process using low voltages and giving a fine-grain, cool sputtering.
• Sputtering: 10,000 won/ea -
Specifications
• Deposition Current 0-150mA
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Applications
• Conductive materials coating