Equipment

Lapping | Lapping

보유장비 관련 정보
Laboratory/Field
Model LP70
Maker Logitech
Technician Seon Jin Lee
Contact 052-217-4193 / sunee6210@unist.ac.kr
Status for Reservation 가능
Reservation Unit 1h Maximum Time (per day) 5h
Open(~ago) 14day Cancel (~ago) 2h
Equipment location 108동 B101호 (Bldg. 108, Room B101)
  • Description

    웨이퍼 Thinning, Polishing 공정 장비

    This equipment is for process of polishing and thinning of wafer

  • Specifications

    Loading : 6inch (wax bonding)

    Plate speed : 5-100rpm (300mm diameter)

    Jig rotation speed : 5-100rpm

    Slurry, Abrasive flow rate : 1-100ml/min (2 Abrasive, 1 Slurry feeding)

    Abrasive : Alumina

    Slurry : Silica

  • Applications