Metal ICP-RIE | 유도결합 플라즈마 금속 건식 식각기
| Laboratory/Field | |||
|---|---|---|---|
| Model | FABStar | ||
| Maker | TTL | ||
| Technician | Min-jae Kim | ||
| Contact | 052-217-4064 / mjkim@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 30min | Maximum Time (per day) | 3Hr |
| Open(~ago) | 14Days | Cancel (~ago) | 2Hr전 |
| Equipment location | 108동 B101호 (Bldg. 108, Room B101) | ||
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Description
유도결합 플라즈마와 가스를 이용하여 Al, Ti, Cr, Au 와 같은 재료를 식각하기 위해서 설계된 장치이다.
This eqipment is designed for etching metals like Al, Ti, Cr, Au
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Specifications
-Process gas : CF4, SF6, Cl2, BCl3, HBr, Ar, O2, N2
-Sample : Standard 150 mm (6 inch)
• Al etch
-Etch rate > 2000 Å/min
-Selectivity (PR) > 2:1
-Uniformity > 95% (150mm)
-Profile angle > 90 ± 5 degree
• Cr
-Etch rate <300 Å/min
-Selectivity (PR) <0.5:1
-Uniformity >95% (150mm)
-Profile angle > 90 ± 5 degree
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Applications
Al, Ti, Cr, Au (Except Cu, Ni)