Wet station_Alkari | 습식세정장치 염기
| Laboratory/Field | |||
|---|---|---|---|
| Model | Wet station | ||
| Maker | Donghoon tech | ||
| Technician | Song-Hee Lee | ||
| Contact | 052-217-4190 / lychle2@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 30min | Maximum Time (per day) | 3hr |
| Open(~ago) | 2주전 | Cancel (~ago) | 2hr |
| Equipment location | 108동 B101호 (Bldg. 108, Room B101) | ||
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Description
This device allows 6” wafer to progress into photoresist development and wet etching process.
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Specifications
• Chemical supply : manual
• Chemical temp. : 50 ~ 120
• Chemical drain : bottle drain (air valve)
• PR wet station (2 Set) : ultrasonic bath, develop bath, Q.D.R bath
• Acid wet station : SC-1, 2 bath, SPM bath, BOE bath, DHF bath, H3PO4 bath, Q.D.R bath
• Solvent wet station
• Etching wet station
• MEMS wet station
• CMOS wet station
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Applications
• Photoresist developing
• Surface cleaning
• Wet etching (Si wafer/SiO2 layer etc. )