보유장비

HR-TEM | 고분해능 투과전자현미경

HR-TEM
보유장비 관련 정보
연구실/분야
모델명 JEM-2100F
제조사 JEOL
담당자 임정환
연락처 052-217-4175 / jhwan0918@unist.ac.kr
예약 가능여부 가능
예약단위 0.5hr 1일최대예약시간 4hr
예약Open(~일 전) 5일전 예약취소불가(~일 전) 2시간전
  • Description

    TEM is used to analyze micro-structures of materials with high spatial resolution. The high voltage electron beam generated from electron gun is illuminated on thin film specimen. The beam penetrating the specimen passes through an array of magnetic lenses and forms a high resolution electron image of the electron diffraction pattern.

  • Specifications

    • Acceleration voltage : 200 kV

    • Lattice resolution : 0.102 nm

    • BF-STEM resolution : 0.14 nm (Gatan)

    • HAADF-STEM resolution : 0.096 nm (Jeol)

    • Probe stability : 1 nm/min or less

    • Stage stability : 1 nm/min or less

    • EDS resolution : 128 eV (Oxford, x-Max T-80)

    • EELS resolution : 0.8 eV (Gatan, Enfina)

    • Contamination : 1 nm/min or less

  • Applications

    • Ultra high resolution electron imaging

    • Diffraction pattern

    • STEM imaging (BF, HAADF)

    • Energy dispersive spectroscopy (EDS)

    • Electron energy loss spectroscopy (EELS)