Nano Imprinter | 나노임프린트 묘화시스템
Nano-Imprint fundamental principle is to transfer the master patterns defined in the stamp to deformable materials such as Photo-resist spun on substrate by mechanical press.
• Curing type : UV, thermal, UV & thermal
• Imprint area : ~ 6 inch
• Stamp : Quartz, Si, Ni, PDMS, PMMA, etc.
• Imprint Pressure : ≤ 2 bar (UV), ≤ 60 bar (Thermal)
• UV System : ~ 50 mw/cm2, 2 Kw
• Temperature : RT ~ 250 °C
• Nanostructure device imprint fabrication
• Functional device chemical & bio sensor