PR Asher | 폴리머 식각장치
| 연구실/분야 | |||
|---|---|---|---|
| 모델명 | V15-G | ||
| 제조사 | KAMI | ||
| 담당자 | 이선진 | ||
| 연락처 | 052-217-4193 / [email protected] | ||
| 예약 가능여부 | 가능 | ||
| 예약단위 | 30min | 1일최대예약시간 | 1hr |
| 예약Open(~일 전) | 2주전 | 예약취소불가(~일 전) | 2hr |
| 장비위치 | 108동 B101호 (Bldg. 108, Room B101) | ||
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Description
The equipment removes selectively coated photoresist for the semiconductor process using gas plasma.
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Specifications
• 250 x 250 x 250 mm, aluminum chamber
• Reactor with 250 mm water cooled chuck
• Microwave power generator : 2.45 GHz, from 100 up to max. 600 W
• Gas inlet : 2 gas inlet pipes (top side mounted)
• O2, Ar gas control unit (MFC) : ≥ 200 ml/min
• Process storage capability of 10 main process with 16 sub-process, rotation table 19”
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Applications
• Polymer elimination
• Photoresist residue elimination
• Polymer layer thickness control