보유장비

PE CVD_#2 (SORONA) | 플라즈마 화학기상 증착기 Ⅱ

PE CVD_#2 (SORONA)
보유장비 관련 정보
연구실/분야
모델명 PEH-600
제조사 SORONA
담당자 김형일
연락처 052-217-4065 / hikim78@unist.ac.kr
예약 가능여부 가능
예약단위 1hr 1일최대예약시간 3hr
예약Open(~일 전) 2주전 예약취소불가(~일 전) 2hr
장비위치 108동 B101호 (Bldg. 108, Room B101)
  • Description

    PECVD System is a multipurpose tool capable of deposition silicon oxide, silicon nitride using electron energy (plasma) as the activation method to enable deposition at a low temperature and at a reasonable rate.

  • Specifications

    • Wafer Size : 4 ~ 6 inch silicon wafer

    Max Substrate Temperature : 400 °C

    • High Plasma Density, High Dep. rate PE-CVD

    • Power Supply : 600 W, 13.56 MHz RF Generator

    • Process guarantee : 1000 Å ~ 2 um

    • Uniformity : less than ± 3 % within wafer

    • Wafer to Wafer Uniformity : ± 3 %

    • Uniform process gas flow distribution

  • Applications

    • Passivation layer of semiconductor

    • Inter metal dielectric of semiconductor

    • Inter layer dielectric of semiconductor