RF Sputter | 고주파 스퍼터링 시스템
| 연구실/분야 | |||
|---|---|---|---|
| 모델명 | SRN-120 | ||
| 제조사 | SORONA | ||
| 담당자 | 김형일 | ||
| 연락처 | 052-217-4065 / hikim78@unist.ac.kr | ||
| 예약 가능여부 | 가능 | ||
| 예약단위 | 1hr | 1일최대예약시간 | 2hr |
| 예약Open(~일 전) | 2주전 | 예약취소불가(~일 전) | 2hr |
| 장비위치 | 108동 B101호(Bldg, 108, Room B101) | ||
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Description
RF Sputtering system is a multi-purpose tool generating plasma inside chamber supplying 13.56 Mhz RF power to cathode and capable of thin film deposition of insulator on wafer by sputtering an insulator target by self bias voltage.
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Specifications
• Substrate size : 4, 6 inch wafer
• Substrate rotation speed : 0 ~ 60 rpm
• RF pre-cleaning : 300 W, automatic processing
• Substrate heating : 400 °C ± 3 % (wafer temp)
• Target : ITO, ZnO, SiO2, Al2O3, TiO2
• Power source : 13.56 Mhz RF power
• Uniformity : less than ± 5 % within wafer
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Applications
• Thin film for semiconductor
• Insulation layer deposition