Wet station_Alkari | 습식세정장치 염기
| 연구실/분야 | |||
|---|---|---|---|
| 모델명 | Wet station | ||
| 제조사 | Donghoon tech | ||
| 담당자 | 이송희 | ||
| 연락처 | 052-217-4190 / lychle2@unist.ac.kr | ||
| 예약 가능여부 | 가능 | ||
| 예약단위 | 30min | 1일최대예약시간 | 3hr |
| 예약Open(~일 전) | 2주전 | 예약취소불가(~일 전) | 2hr |
| 장비위치 | 108동 B101호 (Bldg. 108, Room B101) | ||
-
Description
This device allows 6” wafer to progress into photoresist development and wet etching process.
-
Specifications
• Chemical supply : manual
• Chemical temp. : 50 ~ 120
• Chemical drain : bottle drain (air valve)
• PR wet station (2 Set) : ultrasonic bath, develop bath, Q.D.R bath
• Acid wet station : SC-1, 2 bath, SPM bath, BOE bath, DHF bath, H3PO4 bath, Q.D.R bath
• Solvent wet station
• Etching wet station
• MEMS wet station
• CMOS wet station
-
Applications
• Photoresist developing
• Surface cleaning
• Wet etching (Si wafer/SiO2 layer etc. )