HR-TEM | 고분해능 투과전자현미경
| 연구실/분야 | |||
|---|---|---|---|
| 모델명 | JEM-2100F | ||
| 제조사 | JEOL | ||
| 담당자 | 임정환 | ||
| 연락처 | 052-217-4175 / jhwan0918@unist.ac.kr | ||
| 예약 가능여부 | 가능 | ||
| 예약단위 | 0.5hr | 1일최대예약시간 | 2hr |
| 예약Open(~일 전) | 5일전 | 예약취소불가(~일 전) | 2시간전 |
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Description
TEM is used to analyze micro-structures of materials with high spatial resolution. The high voltage electron beam generated from electron gun is illuminated on thin film specimen. The beam penetrating the specimen passes through an array of magnetic lenses and forms a high resolution electron image of the electron diffraction pattern.
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Specifications
• Acceleration voltage : 200 kV
• Lattice resolution : 0.102 nm
• BF-STEM resolution : 0.14 nm (Gatan)
• HAADF-STEM resolution : 0.096 nm (Jeol)
• Probe stability : 1 nm/min or less
• Stage stability : 1 nm/min or less
• EDS resolution : 128 eV (Oxford, x-Max T-80)
• EELS resolution : 0.8 eV (Gatan, Enfina)
• Contamination : 1 nm/min or less
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Applications
• Ultra high resolution electron imaging
• Diffraction pattern
• STEM imaging (BF, HAADF)
• Energy dispersive spectroscopy (EDS)