Photolitho_MA6_#2 | 마스크 정렬노광기
| 연구실/분야 | |||
|---|---|---|---|
| 모델명 | MA6 | ||
| 제조사 | Suss Microtec | ||
| 담당자 | 황은정 | ||
| 연락처 | 052-217-4192 / hej9204@unist.ac.kr | ||
| 예약 가능여부 | 가능 | ||
| 예약단위 | 30min | 1일최대예약시간 | 3hr |
| 예약Open(~일 전) | 2주전 | 예약취소불가(~일 전) | 2hr |
| 장비위치 | 108동 B101호 (Bldg.108, Room B101) | ||
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Description
MA6 performs alignment and exposures by UV lamp on the wafer and substrates coated by Photo-resist through mask with alignment keys.
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Specifications
• High efficiency & high accurate UV exposure system
• UV lamp : Hg 350 W
• UV 400 : 350 ~ 450 nm (I-, H-, G-line)
• Gap adjustment accuracy : 1μm
• Methods : top & back side alignment
• Alignment accuracy : 1μm
• Exposure type : vacuum, low vac., proximity, hard, soft, flood-exposure mode
• Semi automatic system
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Applications
• Micro scale patterning for semiconductor process
• MEMS / Nano device fabrication