UHV CVD | 초고진공 화학기상 증착기
| 연구실/분야 | |||
|---|---|---|---|
| 모델명 | UHV-CVD | ||
| 제조사 | Woosin CryoVac | ||
| 담당자 | 김형일 | ||
| 연락처 | 052-217-4065 / [email protected] | ||
| 예약 가능여부 | 가능 | ||
| 예약단위 | 3hr | 1일최대예약시간 | 8hr |
| 예약Open(~일 전) | 2주전 | 예약취소불가(~일 전) | 2hr |
| 장비위치 | 108동 B101호 (Bldg. 108, Room B101) | ||
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Description
UHV CVD system is the device which creates new qualified wafer based on chemical reaction between gas and sample by spraying a gas to keep base pressure at 1x10-9 torr
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Specifications
• Main chamber : 500 mm (vacuum range : 1 x 10-10)
• Load lock chamber : 200 mm
• Magnetic transfer probe : 800 mm stroke include linear guide & sample transfer line
• Heater stage : 1,300 °C temp. 2" target
• Gas supply : MFC 2 sets (H2 , N2)
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Applications
• High quality annealing for MEMS / nano device