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Ellipsometer | 박막 두께 측정기

Ellipsometer
보유장비 관련 정보
연구실/분야
모델명 Elli-SE-UaM8
제조사 Elipso Technology
담당자 이루다
연락처 052-217-4022 / luda30159@unist.ac.kr
예약 가능여부 가능
예약단위 30min 1일최대예약시간 1hr
예약Open(~일 전) 2주전 예약취소불가(~일 전) 2hr
장비위치 108동 B101호 (Bldg. 108, Room B101)
  • Description

    Ellipsometry is an optical technique for investigating the dielectric properties of thin films. Ellipsometry can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated

  • Specifications

    • Wavelength range : 240 nm ~ 1000 nm (CCD Type)

    • Beam spot size : ≥ 1.5 mm

    • Measuring constants Film thickness, n, k vs λ

    • Thickness range : sub A ~ 10 μm (depends on film type)

    • Number of layers Up to 10 layers (depends on film type)

    • Throughput 1 10~15sec. per point (depends on film type)

    • Repeatability2 (3σ) ± 0.3 A on 10 times measurement

    • 2D, 3D Mapping Data Display

  • Applications

    • Semiconductor : Poly-Si, GaAs, GaN, ZnS, SiGe, ONO, SOI, SiLk

    • Dielectric material : SiO2, Si3N4, ITO, TiO2, ZrO2, BTS, HfO2

    • Polymer : PVA, PET, PP, PR