Helios 450HP FIB | 이온집속빔
| 연구실/분야 | |||
|---|---|---|---|
| 모델명 | Helios NanoLab 450 | ||
| 제조사 | FEI | ||
| 담당자 | 조미선 | ||
| 연락처 | 052-217-4034 / shail019@unist.ac.kr | ||
| 예약 가능여부 | 가능 | ||
| 예약단위 | 0.5hr | 1일최대예약시간 | 4hr |
| 예약Open(~일 전) | 5일전 | 예약취소불가(~일 전) | 2시간전 |
-
Description
Dual-beam FIB has a multitude of capabilities including high resolution electron imaging, ion imaging, nano device fabrication, and material deposition. Simultaneous patterning and imaging are possible to nm resolution for both imaging and machining. FIB with both ion and electron beams enables highprecision cross-section processing and TEM/3DAP sample preparation.
-
Specifications
• Electron optics - Resolution
HV : 0.9 nm @15 kV, 1.4 nm @1 kV
- Accelerating voltage : 1 kV ~ 30 kV
- Probe current : up to 200 nA
- Magnification : 30 x ~ 1,280 kx
• Ion optics - Resolution : 5 nm @30 kV
- Beam voltage : 500 V - 30 kV
• Multi chem gas injection systems (C, Pt, W, H2O)
-
Applications
• Ultra high resolution electron, ion imaging
• TEM sample preparation
• Energy dispersive spectroscopy (EDS)
• SE, BSE imaging