보유장비

Photolitho_MA6_#2 | 마스크 정렬노광기

Photolitho_MA6_#2
보유장비 관련 정보
연구실/분야
모델명 MA6
제조사 Suss Microtec
담당자 배고명
연락처 052-217-4189 / bgm0421@unist.ac.kr
예약 가능여부 가능
예약단위 30min 1일최대예약시간 3hr
예약Open(~일 전) 2주전 예약취소불가(~일 전) 2hr
장비위치 108동 B101호 (Bldg.108, Room B101)
  • Description

    MA6 performs alignment and exposures by UV lamp on the wafer and substrates coated by Photo-resist through mask with alignment keys.

  • Specifications

    • High efficiency & high accurate UV exposure system

    • UV lamp : Hg 350 W

    • UV 400 : 350 ~ 450 nm (I-, H-, G-line)

    • Gap adjustment accuracy : 1μm

    • Methods : top & back side alignment

    • Alignment accuracy : 1μm

    • Exposure type : vacuum, low vac., proximity, hard, soft, flood-exposure mode

    • Semi automatic system

  • Applications

    • Micro scale patterning for semiconductor process

    • MEMS / Nano device fabrication