UHV CVD | 초고진공 화학기상 증착기
| Laboratory/Field | |||
|---|---|---|---|
| Model | UHV-CVD | ||
| Maker | Woosin CryoVac | ||
| Technician | Hyung Il Kim | ||
| Contact | 052-217-4065 / hikim78@unist.ac.kr | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 3hr | Maximum Time (per day) | 8hr |
| Open(~ago) | 2주전 | Cancel (~ago) | 2hr |
| Equipment location | 108동 B101호 (Bldg. 108, Room B101) | ||
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Description
UHV CVD system is the device which creates new qualified wafer based on chemical reaction between gas and sample by spraying a gas to keep base pressure at 1x10-9 torr
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Specifications
• Main chamber : 500 mm (vacuum range : 1 x 10-10)
• Load lock chamber : 200 mm
• Magnetic transfer probe : 800 mm stroke include linear guide & sample transfer line
• Heater stage : 1,300 °C temp. 2" target
• Gas supply : MFC 2 sets (H2 , N2)
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Applications
• High quality annealing for MEMS / nano device