Equipment

UHV CVD | 초고진공 화학기상 증착기

보유장비 관련 정보
Laboratory/Field
Model UHV-CVD
Maker Woosin CryoVac
Technician Hyung Il Kim
Contact 052-217-4065 / hikim78@unist.ac.kr
Status for Reservation 가능
Reservation Unit 3hr Maximum Time (per day) 8hr
Open(~ago) 2주전 Cancel (~ago) 2hr
Equipment location 108동 B101호 (Bldg. 108, Room B101)
  • Description

    UHV CVD system is the device which creates new qualified wafer based on chemical reaction between gas and sample by spraying a gas to keep base pressure at 1x10-9 torr

  • Specifications

    • Main chamber : 500 mm (vacuum range : 1 x 10-10)

    • Load lock chamber : 200 mm

    • Magnetic transfer probe : 800 mm stroke include linear guide & sample transfer line

    • Heater stage : 1,300 °C temp. 2" target

    • Gas supply : MFC 2 sets (H2 , N2)

  • Applications

    • High quality annealing for MEMS / nano device