Equipment

Parylene Coater | 페럴린 증착장치

보유장비 관련 정보
Laboratory/Field
Model -
Maker Alpha plus
Technician Hyung Il Kim
Contact 052-217-4065 / hikim78@unist.ac.kr
Status for Reservation 가능
Reservation Unit 4hr Maximum Time (per day) 4hr
Open(~ago) 2주전 Cancel (~ago) 2hr
Equipment location 108동 B101호(Bldg, 108, Room B101)
  • Description

    The Dimer is inserted into the vaporizer in the powder form and evaporated between 120 - 175 °C Furnace chamber heated to approximately 650 - 690 degrees through the monomer which is converted to the substrate. After the process, the temperature is recovered to room temperature, creating a Poly-para-Xylylene film coating.

  • Specifications

    • Dimer type : c

    • Deposition rate : over 1-2 um/hr

    • Substrate size : max. dia. 200 mm

    • Process temperature - furnace (R/T to 1000 °C ± °C)

    - /Vaporizer (R/T to 300 °C ± 3 °C)

    • Thickness variation : less than ± 10 % within wafer

  • Applications

    • MEMS / NANO Device

    • SAW filters

    • UV embossing / Nano imprint lithography

    • Telecommunication devices