Nano Imprinter | 나노임프린트 묘화시스템
| Laboratory/Field | |||
|---|---|---|---|
| Model | ANT-6HR | ||
| Maker | KIMM | ||
| Technician | Min-jae Kim | ||
| Contact | 052-217-4064 / [email protected] | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 1hr | Maximum Time (per day) | 3hr |
| Open(~ago) | 2주전 | Cancel (~ago) | 2hr |
| Equipment location | 108동 B101호 (Bldg. 108, Room B101) | ||
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Description
Nano-Imprint fundamental principle is to transfer the master patterns defined in the stamp to deformable materials such as Photo-resist spun on substrate by mechanical press.
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Specifications
• Curing type : UV, thermal, UV & thermal
• Imprint area : ~ 6 inch
• Stamp : Quartz, Si, Ni, PDMS, PMMA, etc.
• Imprint Pressure : ≤ 2 bar (UV), ≤ 60 bar (Thermal)
• UV System : ~ 50 mw/cm2, 2 Kw
• Temperature : RT ~ 250 °C
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Applications
• Nanostructure device imprint fabrication
• Functional device chemical & bio sensor