Hitachi Sputter

보유장비 관련 정보
Model E-1045
Maker Hitachi
Technician Gyeong Ae Lee
Contact 052-217-4163 / [email protected]
Status for Reservation 가능
Reservation Unit Maximum Time (per day)
Open(~ago) Cancel (~ago)
Equipment location 102동 B110호(Bldg.102, Room B110)
  • Description

    Sputter system employs a magnetron target assembly, which enhances the efficiency of the process using low voltages and giving a fine-grain, cool sputtering.

    • Sputtering: 10,000 won/ea

  • Specifications

    • Deposition Current 0-150mA

  • Applications

    • Conductive materials coating