FE-TEM | 투과전자현미경

보유장비 관련 정보
Model Tecnai G2 F20 X-Twin
Maker FEI
Technician Chae-eun Hong
Contact 052-217-4177 / [email protected]
Status for Reservation 불가능
Reservation Unit 0.5hr Maximum Time (per day) 2hr
Open(~ago) 5일전 Cancel (~ago) 2시간전
Equipment location 102동 B109호 (Bldg.102, Room B109)
  • Description

    TEM is used to analyze micro-structures of materials with high spatial resolution. The high voltage electron beam generated from electron gun is illuminated on thin film specimen. The beam penetrating the specimen passes through an array of magnetic lenses and forms a high resolution electron image of the electron diffraction pattern.

  • Specifications

    • Acceleration voltage: 200 kV

    • Point resolution: 0.25 nm

    • TEM Line resolution: 0.102 nm

    • Specimen tilting: X = ± 30 °, Y = ± 30 °

    • Image recording system: CCD

  • Applications

    • High resolution electron imaging

    • Diffraction pattern

    • STEM imaging (HAADF)

    • Energy dispersive spectroscopy (EDS)