Equipment

Ellipsometer | 박막 두께 측정기

보유장비 관련 정보
Laboratory/Field
Model Elli-SE-UaM8
Maker Elipso Technology
Technician Luda Lee
Contact 052-217-4022 / luda30159@unist.ac.kr
Status for Reservation 가능
Reservation Unit 30min Maximum Time (per day) 1hr
Open(~ago) 2주전 Cancel (~ago) 2hr
  • Description

    Ellipsometry is an optical technique for investigating the dielectric properties of thin films. Ellipsometry can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated

  • Specifications

    • Wavelength range : 240 nm ~ 1000 nm (CCD Type)

    • Beam spot size : ≥ 1.5 mm

    • Measuring constants Film thickness, n, k vs λ

    • Thickness range : sub A ~ 10 μm (depends on film type)

    • Number of layers Up to 10 layers (depends on film type)

    • Throughput 1 10~15sec. per point (depends on film type)

    • Repeatability2 (3σ) ± 0.3 A on 10 times measurement

    • 2D, 3D Mapping Data Display

  • Applications

    • Semiconductor : Poly-Si, GaAs, GaN, ZnS, SiGe, ONO, SOI, SiLk

    • Dielectric material : SiO2, Si3N4, ITO, TiO2, ZrO2, BTS, HfO2

    • Polymer : PVA, PET, PP, PR