Equipment

Dielectric RIE | 건식 식각장치

보유장비 관련 정보
Laboratory/Field
Model Labstar
Maker TTL
Technician Kang O Kim
Contact 052-217-4182 / ko8809@unist.ac.kr
Status for Reservation 가능
Reservation Unit 1hr Maximum Time (per day) 1hr
Open(~ago) 2주전 Cancel (~ago) 2hr
Equipment location 108동 B101호 (Bldg. 108, Room B101)
  • Description

    Reactive ion etcher forms fine patterns by dry etching placing wafer inside the process module and generating plasma.

  • Specifications

    • RF Power : Max. 500 W

    • Pressure : 0~1000 mTorr

    • Gas : CF4, CHF3, Ar, O2 (Max. 200 sccm for each)

    • Sample Size : Max. 6 inch

  • Applications

    • Si / SiO2 / Si3N4 dry etching

    • ETC. material etching (Not metal)