Normal-TEM | 범용 투과전자현미경
| Laboratory/Field | |||
|---|---|---|---|
| Model | JEM-2100 | ||
| Maker | JEOL | ||
| Technician | Jeong-hwan Lim | ||
| Contact | 052-217-4175 / [email protected] | ||
| Status for Reservation | 가능 | ||
| Reservation Unit | 0.5hr | Maximum Time (per day) | 2hr |
| Open(~ago) | 5일전 | Cancel (~ago) | 2시간전 |
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Description
TEM is used to analyze micro-structures of materials with high spatial resolution. The high voltage electron beam generated from electron gun is illuminated on thin film specimen. The beam penetrating the specimen passes through an array of magnetic lenses and forms a high resolution electron image of the electron diffraction pattern.
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Specifications
• Acceleration voltage : 200 kV
• Point resolution : 0.23 nm
• Lattice resolution : 0.14 nm
• Specimen tilting : X = ± 35 °, Y = ± 30 °
• Image recording system : CCD
• EDS resolution : 132 eV
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Applications
• High resolution electron imaging
• Diffraction pattern