Equipment

Helios 450HP FIB | 이온집속빔

보유장비 관련 정보
Laboratory/Field
Model Helios NanoLab 450
Maker FEI
Technician Sun-yi Lee
Contact 052-217-4023 / [email protected]
Status for Reservation 가능
Reservation Unit 0.5hr Maximum Time (per day) 4hr
Open(~ago) 5일전 Cancel (~ago) 2시간전
Equipment location 102동 B108호
  • Description

    샘플 배송 주소
    울산시 울주군 언양읍 유니스트길 50, 102동 201-5호

    Dual-beam FIB has a multitude of capabilities including high resolution electron imaging, ion imaging, nano device fabrication, and material deposition. Simultaneous patterning and imaging are possible to nm resolution for both imaging and machining. FIB with both ion and electron beams enables highprecision cross-section processing and TEM/3DAP sample preparation.

  • Specifications

    • Electron optics - Resolution

    HV : 0.9 nm @15 kV, 1.4 nm @1 kV

    - Accelerating voltage : 1 kV ~ 30 kV

    - Probe current : up to 200 nA

    - Magnification : 30 x ~ 1,280 kx

    • Ion optics - Resolution : 5 nm @30 kV

    - Beam voltage : 500 V - 30 kV

    • Multi chem gas injection systems (C, Pt, W, H2O)

  • Applications

    • Ultra high resolution electron, ion imaging

    • TEM sample preparation

    • Energy dispersive spectroscopy (EDS)

    • SE, BSE imaging